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氢氟酸（SG）

Items	Unit	SG(SEMI GRADE)
		EL （SEMI G1）	UP （SEMI G2）	UPS （SEMI G3）	UPSS （SEMI G4）	UPSSS （SEMI G5）
Content	% ≥	40-70	40-70	40-70	40-70	40-70
Fluosilicic acid	≤	100ppm	20000ppb	10000ppb	50ppb	10ppb
Cl	≤	5ppm	5000ppb	500ppb	50ppb	3ppb
NO3	≤	3ppm	3000ppb	300ppb	10ppb	3ppb
PO4	≤	1ppm	1000ppb	100ppb	10ppb	6ppb
SO4	≤	5ppm	2000ppb	200ppb	20ppb	10ppb
SO4+SO3	≤	-	2500ppb	400ppb	30ppb	10ppb
Color	APHA≤	5	5	5	5	5
Particle (N0.2um)	pcs/ml≤			50	50	2
Particle (N0.3um)	pcs/ml≤				30	5
Particle (N0.5um)	pcs/ml≤		50		10	10(N0.05um)
Li	ppb≤	20	50	1	0.1	0.02
B	ppb≤	50	50	1	0.1	0.02
Be	ppb≤	20	50	1	0.1	0.02
Na	ppb≤	100	50	1	0.1	0.02
Mg	ppb≤	50	50	1	0.1	0.02
Al	ppb≤	30	50	1	0.1	0.02
K	ppb≤	40	50	1	0.1	0.02
Ca	ppb≤	50	50	1	0.1	0.02
Ti	ppb≤	10	50	1	0.1	0.02
Cr	ppb≤	10	50	1	0.1	0.02
Mn	ppb≤	50	50	1	0.1	0.02
Fe	ppb≤	100	50	1	0.1	0.02
Co	ppb≤	50	50	1	0.1	0.02
Ni	ppb≤	50	50	1	0.1	0.02
Cu	ppb≤	10	50	1	0.1	0.02
Zn	ppb≤	50	50	1	0.1	0.02
Ga	ppb≤	50	50	1	0.1	0.02
As	ppb≤	100	50	1	0.1	0.02
Mo	ppb≤	100	50	1	0.1	0.02
Ag	ppb≤	50	50	1	0.1	0.02
Cd	ppb≤	50	50	1	0.1	0.02
Sn	ppb≤	50	50	1	0.1	0.02
Ba	ppb≤	50	50	1	0.1	0.02
Au	ppb≤	50	50	1	0.1	0.02
Pt	ppb≤	50	50	1	0.1	0.02
Pb	ppb≤	50	50	1	0.1	0.02
Bi	ppb≤	50	50	1	0.1	0.02
Nb	ppb≤	50	50	1	0.1	0.02
Sr	ppb≤	50	50	1	0.1	0.02
Ti	ppb≤	50	50	1	0.1	0.02
Ge	ppb≤	50	50	1	0.1	0.02
Zr	ppb≤	50	50	1	0.1	0.02
V	ppb≤	10	50	1	0.1	0.02
Ta	ppb≤	50	50	1	0.1	0.02
Sb	ppb≤	50	50	1	0.1	0.02

Packed in 25kg/drum,240kg/drum,1150kg/IBC

CAS No : 7664-39-3

Formula : HF

1. Semiconductor manufacturing ‌ : In the semiconductor manufacturing process, electronic grade hydrofluoric acid is mainly used for cleaning and etching silicon wafers.

‌2. Microelectronics industry ‌ : In the microelectronics industry, electronic grade hydrofluoric acid is used in the manufacture of microcircuits and integrated circuits

‌3. Photovoltaic industry ‌ : In the photovoltaic industry, electronic grade hydrofluoric acid is used in the production process of solar panels, especially in the cleaning and surface treatment of silicon wafers. It helps to improve the photovoltaic conversion efficiency of the panel, thereby improving the performance of the solar cell.

‌4. Liquid crystal display ‌ : In the liquid crystal display industry, electronic grade hydrofluoric acid is used for glass substrate cleaning, silicon nitride and silicon dioxide etching processes

Storage condition:

1.Ventilated, dry and cool place, avoid direct sunlight

2.The temperature does not exceed 30 degrees, and the humidity is maintained at 30%-60%

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氢氟酸（SG）