
Hydrofluoric Acid
Items | Unit | SG(SEMI GRADE) | ||||
---|---|---|---|---|---|---|
EL (SEMI G1) |
UP (SEMI G2) |
UPS (SEMI G3) |
UPSS (SEMI G4) |
UPSSS (SEMI G5) |
||
Content | % ≥ | 40-70 | 40-70 | 40-70 | 40-70 | 40-70 |
Fluosilicic acid | ≤ | 100ppm | 20000ppb | 10000ppb | 50ppb | 10ppb |
Cl | ≤ | 5ppm | 5000ppb | 500ppb | 50ppb | 3ppb |
NO3 | ≤ | 3ppm | 3000ppb | 300ppb | 10ppb | 3ppb |
PO4 | ≤ | 1ppm | 1000ppb | 100ppb | 10ppb | 6ppb |
SO4 | ≤ | 5ppm | 2000ppb | 200ppb | 20ppb | 10ppb |
SO4+SO3 | ≤ | - | 2500ppb | 400ppb | 30ppb | 10ppb |
Color | APHA≤ | 5 | 5 | 5 | 5 | 5 |
Particle (N0.2um) | pcs/ml≤ | 50 | 50 | 2 | ||
Particle (N0.3um) | pcs/ml≤ | 30 | 5 | |||
Particle (N0.5um) | pcs/ml≤ | 50 | 10 | 10(N0.05um) | ||
Li | ppb≤ | 20 | 50 | 1 | 0.1 | 0.02 |
B | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Be | ppb≤ | 20 | 50 | 1 | 0.1 | 0.02 |
Na | ppb≤ | 100 | 50 | 1 | 0.1 | 0.02 |
Mg | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Al | ppb≤ | 30 | 50 | 1 | 0.1 | 0.02 |
K | ppb≤ | 40 | 50 | 1 | 0.1 | 0.02 |
Ca | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Ti | ppb≤ | 10 | 50 | 1 | 0.1 | 0.02 |
Cr | ppb≤ | 10 | 50 | 1 | 0.1 | 0.02 |
Mn | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Fe | ppb≤ | 100 | 50 | 1 | 0.1 | 0.02 |
Co | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Ni | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Cu | ppb≤ | 10 | 50 | 1 | 0.1 | 0.02 |
Zn | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Ga | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
As | ppb≤ | 100 | 50 | 1 | 0.1 | 0.02 |
Mo | ppb≤ | 100 | 50 | 1 | 0.1 | 0.02 |
Ag | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Cd | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Sn | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Ba | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Au | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Pt | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Pb | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Bi | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Nb | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Sr | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Ti | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Ge | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Zr | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
V | ppb≤ | 10 | 50 | 1 | 0.1 | 0.02 |
Ta | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Sb | ppb≤ | 50 | 50 | 1 | 0.1 | 0.02 |
Packed in 25kg,240kg,1150kg
CAS No : 7664-39-3
Formula : HF
1. Semiconductor manufacturing : In the semiconductor manufacturing process, electronic grade hydrofluoric acid is mainly used for cleaning and etching silicon wafers.
2. Microelectronics industry : In the microelectronics industry, electronic grade hydrofluoric acid is used in the manufacture of microcircuits and integrated circuits
3. Photovoltaic industry : In the photovoltaic industry, electronic grade hydrofluoric acid is used in the production process of solar panels, especially in the cleaning and surface treatment of silicon wafers. It helps to improve the photovoltaic conversion efficiency of the panel, thereby improving the performance of the solar cell.
4. Liquid crystal display : In the liquid crystal display industry, electronic grade hydrofluoric acid is used for glass substrate cleaning, silicon nitride and silicon dioxide etching processes

Storage condition:
1.Ventilated, dry and cool place, avoid direct sunlight
2.The temperature does not exceed 30 degrees, and the humidity is maintained at 30%-60%